Safematic CCU-010 HV high vacuum sputter coater
Fully automatic, high vacuum sputter coating
The Safematic CCU-010 HV sets new standards for high vacuum sputter coating and is suitable for both SEM and TEM sputtering applications with oxidising and non-oxidising metals - plus for thin film applications. The CCU-010 HV has impressive high vacuum performance which helps ensure coating quality that is optimal for both W-SEM and FE-SEM applications. A patented, plug-in-style sputtering head module delivers unsurpased ease of use and servicing - with a carbon evaporation module available as a plug in option.
The glass vacuum chamber is 120mm in diameter and includes a handy vertical graduated scale for setting the height of the specimen stage. An implosion guard with safety monitoring is also fitted. There are specimen stage options to suit most applications and other options - including a wide range of sputtering targets and upgrades to high vacuum and to carbon evaporation.
CCU-010 HV sputter coater highlights
- fully automatic, fine-grain sputtering for SEM
- interchangeable, self-contained, plug-in style coating modules
- integral, oil-free, high vacuum turbomolecular pumping
- high quality sputtering of oxidising and non-oxidising metal
- dual-location quartz crystal film thickness measurement - fitted as standard
- intuitive, touch-screen control - rapid data input, simple operation
Sputter coating modules for high resolution SEM and thin film coating
The compact sputter coating modules (SP-010 and SP-011) conveniently include all the features required for the highest quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The high vacuum capabilities of the CCU-010 HV make it ideal for applications using both oxidising (e.g. Cr, Ir, W, ITO etc.) and non-oxidising (e.g. Au, Au/Pd, Pt etc.) metals. For some thin film coating applications where extended sputtering times are required, the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without any rest periods. For special processes requiring thicker films or very fast sputtering rates the high sputtering module (SP-011) is recommended.
Click here for detailed information: SP-010 and SP-011 sputter coating modules
Dual-position film thickness monitor - fitted as standard
A dual-position film thickness monitor (FTM) measurement system monitors and terminates the coating process at a user-defined thickness. The plug-in monitoring quartz crystal and holder can be moved between the centre of the specimen stage and the outside to accomodate different specimen sizes.
Integrated, oil-free, high vacuum pumping
The CCU-010 HV has a fully integrated Pfeiffer Hi Pace 80 turbomolecular backed by a compact Vacuubrand MD1 Vario-SP membrane pump . Fitted into the main console of the CCU-010 LV, this oil-free pumping system helps to deliver classs-leading vaccuum performance (to 2 x 10-6mbar) whilst considerably reducing the instrument’s footprint (35 x 55cm).
Rotating and rotary planetary specimen stages
The CCU-010 HV includes a static height and tilt angle adjustable plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotation stage is available. For specimens with very irregular surfaces, or for particulates and spheres, the PS-010 rotary planetary stage is recommended.
ET-010 plasma cleaning accessory
The ET-010 plasma cleaning accessory is a fully integrated option for the Safematic CCU-010 sputter/carbon coater that is designed for the pre-treatment or post-treatment of specimens in combination with a coating process. SEM specimens can be pre-cleaned to remove light surface contamination prior to coating, without the need to breaking vacuum between plasma cleaning and sputtering processes. Additionally, TEM carbon films can be converted from hydrophobic to hydrophilic using an air plasma.
Click here for detailed information: ET-010 plasma cleaning accessory
Coating LAB - full range of sputter coating data
Coating LAB is an optiona that gives easy access to coating and process data. The Windows-based software allows access to all the key data - pressure, current, voltage, coating rate, coating thickness and specimen temperature - as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For more details see: Coating LAB.
HS-010 head module vacuum storage box
The HS-010 is a compact vacuum storage box which allows a second CCU-010 coating head for the CCU-010 module, additional planetary or rotary stage and the full range of sputtering targets and carbon thread clean and under vacuum when not in use.
For further information please see: HS-010 vacuum storage box.
To discover more about Safematic's unique coating modules see:
Selecting a coater
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide.
Put us to the test
CCU-010 coating base unit
CCU-010 coating modules
CCU-010 specimen stages and etching accessories
CCU-010 Coating LAB and vacuum storage
Sputtering target - please select your preferred metal/metals
Gold sputter targets
Gold palladium sputter targets
Platinum sputter targets
Other sputter targets
|100001||CCU-010HV. Compact coating system base unit. High vacuum including integrated turbomolecular pump and diaphragm pump (external rotary pump not required)|
|Options for coating and glow discharge|
|100002||SP-010. Sputtering head module|
|100012||SP-011. Sputtering head module for high sputtering rates|
|100003||CT-010. Carbon fibre cord evaporation head module, featuring a carbon tracking system for up to 50 depositions|
|100004||Glow discharge for hydrophobic/hydrophilic treatment of carbon films|
|Specimen stage options. The CCU-010 HV is fitted as standard with static specimen stage, with adjustment for height and tilt but no rotation|
|100005||RS-010 rotation stage (variable speed)|
|100006||PS-010 rotary planetary stage (varible rotation speed)|
|400020||Additional 80mm Ø standard specimen stage|
|100008||Coating LAB software|
|300000||Sputter target gold (Au) 54 Ø x 1.0mm. Purity 99.99%|
|300017||Sputter target gold (Au) 54 Ø x 0.2mm. Purity 99.99%|
|300001||Sputter target gold/palladium (Au/Pd), 80/20, 54mm Ø x 1.0mm. Purity 99.99%|
|300002||Sputter target gold/palladium (Au/Pd), 70/30, 54mm Ø x 1.0mm. Purity 99.99%|
|300003||Sputter target gold/palladium (Au/Pd), 60/40, 54mm Ø x 1.0mm. Purity 99.99%|
|300004||Sputter target platinum (Pt), 54mm Ø x 0.2mm. Purity 99.95%|
|300005||Sputter target silver (Ag), 54mm Ø x 1.0mm. Purity 99.99%|
|300006||Sputter target chromium (Cr), 54mm Ø x 0.5mm. Purity 99.95%|
|300007||Sputter target nickel (Ni), 54mm Ø x 3.5mm. Purity 99.99%|
|300008||Sputter target tungsten (w), 54mm Ø x 1.0mm. Purity 99.95%|
|300009||Sputter target carbon (C), 54mm Ø x 1.0mm. Purity 99.99%|
|300010||Sputter target aluminium (Al), 54mm Ø x 1.0mm. Purity 99.99%|
|300011||Sputter target iron (Fe), 54mm Ø x 3.5mm. Purity 99.99%|
|300012||Sputter target Indium tin oxide (ITO), 54mm Ø x 2.0mm. Purity 99.99%|
|300013||Sputter target copper (Cu), 54mm Ø x 1.0mm. Purity 99.99%|
|300018||Sputter target titanium (Ti), 54mm Ø x 0.2mm. Purity 99.99%|
|300019||Sputter target platinum/Iridium (Pt/Ir), 54mm Ø x 1.0. Purity 99.95%|
|300020||Sputter target iridium (Ir), 54mm Ø x 1.0mm. Purity 99.95%|
|300021||Sputter target platinum/palladium (Pt/Pd), 54mm Ø x 0.5mm. Purity 99.99%|
|300022||Sputter target cobalt (Co), 54mm Ø x 0.35mm. Purity 99.95%|
|Carbon fibre cord|
|300014||Carbon fibre cord on spool (holder), 1m|
|300015||Carbon fibre cord on spool (holder), 2m|
|Spare FTM quartz crystals|
|300016||Spare FTM piezoelectric quartz crystals, gold coated. Pack of 10|
Dimensions (unpacked): L 570 x W 360 x H 350mm. 25kg
Glass cylinder: Ø 120mm (DN 100 ISO-KF compatible)
Implosion guard: Plastic splinter shield around the glass cylinder
Targets: Ø 54mm and thickness up to 3mm
Coating time: 0.5 to 990s
Coating current 10-100mA
Pumping: Integrated, oil-free turbomolecular and membrane pumps
Ultimate vacuum: <2 x 10-6 mbar
Vacuum measurement: Pirani and cold cathode gauges
Display: 115 x 86mm, TFT graphical display
Specimen stage: Ø 80mm, height adjustment 0-50mm, tilt 0-45°
Film thickness measurement: Dual-position film thickness monitoring system. Piezoelectric crystal: frequency 6MHz, Ø 14mm, thickness 0.4mm.
Electrical: Plug C14, 90-260VAC, 47-63 Hz, 500W
Process gas connections: Process gas: Ø 6mm, venting gas: Ø 6mm, plasma gas: Ø 6mm
Electrical: Connector socket C13, secured with 10A therm. circuit breaker