Safematic CCU-010 HV sputter/carbon coater
Fully automatic, high vacuum sputter coating and carbon evaporation
The Safematic CCU-010 HV sets new standards for high vacuum, bench top coating. By selecting preferred sputtering and/or carbon coating head modules, the CCU-010 HV is suitable for both SEM and TEM sputter coating applications using oxidising and non-oxidising metals, plus thin film applications where the high sputtering rate module (SP-011) offers very fast sputtering rates and is optimised for a wide range of metals. The CCU-010 HV has an impressive, class-leading high vacuum performance which ensures carbon coating quality that is optimal for both SEM and TEM applications. Unique, self-contained, plug-in-style sputtering and carbon evaporation head modules deliver unsurpased ease of use and servicing. Two sputtering modules are available - the SP0-010 is ideal for most EM applications, whilst the SP-011 has a magnetron design optimised for fast sputtering rates and an impressive range of sputtering target metals.
A stand-out highlight of the carbon evaporation head is a unique (patented) carbon fibre spooling system. This allows up to 50 carbon coatings to be carried out without the need to change the carbon source - a huge advantage over other labour intensive “single shot” carbon coating systems.
The glass vacuum chamber is 120mm in diameter and has a handy vertical graduated scale to help set the height of the specimen stage. With safety in mind the implosion guard has automatic monitoring so the system cannot be operated unless the guard is in place.
CCU-010 HV sputter/carbon coater highlights
- fully automatic sputtering and carbon coating for SEM and TEM
- interchangeable, self-contained, plug-in style coating modules
- integral, oil-free, high vacuum turbomolecular pumping
- high quality sputtering of oxidising and non-oxidising metal
- up to 50 carbon evaporation coating runs before source change
- dual-location quartz crystal film thickness measurement - fitted as standard
- intuitive, touch-screen control - rapid data input, simple operation
Sputter coating modules for high resolution SEM and thin film coating
The compact sputter coating modules (SP-010 and SP-011) conveniently include all the features required for the highest quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The high vacuum capabilities of the CCU-010 HV make it ideal for applications using both oxidising (e.g. Cr, Ir, W, ITO etc.) and non-oxidising (e.g. Au, Au/Pd, Pt etc.) metals. For some thin film applications where extended sputtering times are required the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without the time consuming "rest periods" that some other coaters require. For special processes requiring thicker films the optional high sputtering module (SP-011) is recommended.
Click here for detailed information: SP-010 and SP-011 sputter coating modules
CT-010 carbon coating module for sequential carbon evaporation and glow discharge
A highlight of the Safematic carbon coating module (CT-010) is the novel carbon fibre evaporation system - featuring a proprietary (patented) automatic carbon fibre spooling system. This allows up to 50 carbon coating runs without the need to change the carbon fibre source – a huge advantage over labour intensive “single shot” carbon coating systems. A primary application of the optional glow discharge attachment (100004) is the hydrophobic-hydrophilic post-treatment of TEM carbon support films. Conveniently both carbon coating and glow discharge treatment can be done sequentially - without the inconvenience of having to “break” vacuum and exchange carbon evaporation and glow discharge process heads.
Click here for detailed information: CT-010 carbon coating module
ET-010 etching accessory
The ET-010 etching accessory is a fully integrated option for the Safematic CCU-010 sputter/carbon coater that is designed for the pre-treatment or post-treatment of specimens in combination with a coating process. SEM specimens can be pre-cleaned to remove light surface contamination prior to coating, without the need to breaking vacuum between etching and sputtering processes. Additionally,TEM carbon films can be converted from hydrophobic to hydrophilic using an air plasma.
Click here for detailed information: ET-010 etching accessory
Dual-position film thickness monitor - fitted as standard
Included as standard is a dual-position film thickness monitor (FTM) measurement system, which monitors and terminates the sputter coating and carbon coating processes at a user-defined thicknesses. To accommodate different specimen sizes the plug-in monitoring quartz crystal and holder can be moved between the centre of the coater specimen stage and the outside .
Integrated, oil-free, high vacuum pumping
The CCU-010 HV has a fully integrated Pfeiffer Hi Pace 80 turbomolecular backed by a compact Vacuubrand MD1 Vario-SP membrane pump . Fitted into the main console of the CCU-010 LV, this oil-free pumping system helps to deliver classs-leading vaccuum performance (to 2 x 10-6mbar) whilst considerably reducing the instrument’s footprint (35 x 55cm).
Rotating and rotary planetary specimen stages
The CCU-010 HV includes a static height and tilt angle adjustable plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotation stage is available. For specimens with very irregular surfaces, or for particulates and spheres, the PS-010 rotary planetary stage is recommended.
This option offers easy access to sputter coating and carbon coating and process data. The Windows-based software allows access to all the key data - pressure, current, voltage, coating rate, coating thickness and specimen temperature - as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For more details see: Coating LAB.
HS-010 head module vacuum storage box
The HS-010 is a compact vacuum storage box which allows a second CCU-010 coating head for the CCU-010 module, additional planetary or rotary stage and the full range of sputtering targets and carbon thread clean and under vacuum when not in use.
For further information please see: HS-010 vacuum storage box.
Selecting a sputter/carbon coater
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide
Put us to the test
|100001||CCU-010HV. Compact coating system base unit. High vacuum including integrated turbomolecular pump and diaphragm pump (external rotary pump not required)|
|Options for coating and glow discharge|
|100002||SP-010. Sputtering head module|
|100012||SP-011. Sputtering head module for high sputtering rates|
|100003||CT-010. Carbon fibre cord evaporation head module, featuring a carbon tracking system for up to 50 depositions|
|100004||Glow discharge for hydrophobic/hydrophilic treatment of carbon films|
|Specimen stage options. The CCU-010 HV is fitted as standard with static specimen stage, with adjustment for height and tilt but no rotation|
|100005||RS-010 rotation stage (variable speed)|
|100006||PS-010 rotary planetary stage (varible rotation speed)|
|400020||Additional 80mm Ø standard specimen stage|
|100008||Coating LAB software|
|300000||Sputter target gold (Au) 54 Ø x 1.0mm. Purity 99.99%|
|300017||Sputter target gold (Au) 54 Ø x 0.2mm. Purity 99.99%|
|300001||Sputter target gold/palladium (Au/Pd), 80/20, 54mm Ø x 1.0mm. Purity 99.99%|
|300002||Sputter target gold/palladium (Au/Pd), 70/30, 54mm Ø x 1.0mm. Purity 99.99%|
|300003||Sputter target gold/palladium (Au/Pd), 60/40, 54mm Ø x 1.0mm. Purity 99.99%|
|300004||Sputter target platinum (Pt), 54mm Ø x 0.2mm. Purity 99.95%|
|300005||Sputter target silver (Ag), 54mm Ø x 1.0mm. Purity 99.99%|
|300006||Sputter target chromium (Cr), 54mm Ø x 0.5mm. Purity 99.95%|
|300007||Sputter target nickel (Ni), 54mm Ø x 3.5mm. Purity 99.99%|
|300008||Sputter target tungsten (w), 54mm Ø x 1.0mm. Purity 99.95%|
|300009||Sputter target carbon (C), 54mm Ø x 1.0mm. Purity 99.99%|
|300010||Sputter target aluminium (Al), 54mm Ø x 1.0mm. Purity 99.99%|
|300011||Sputter target iron (Fe), 54mm Ø x 3.5mm. Purity 99.99%|
|300012||Sputter target Indium tin oxide (ITO), 54mm Ø x 2.0mm. Purity 99.99%|
|300013||Sputter target copper (Cu), 54mm Ø x 1.0mm. Purity 99.99%|
|300018||Sputter target titanium (Ti), 54mm Ø x 0.2mm. Purity 99.99%|
|300019||Sputter target platinum/Iridium (Pt/Ir), 54mm Ø x 1.0. Purity 99.95%|
|300020||Sputter target iridium (Ir), 54mm Ø x 1.0mm. Purity 99.95%|
|300021||Sputter target platinum/palladium (Pt/Pd), 54mm Ø x 0.5mm. Purity 99.99%|
|300022||Sputter target cobalt (Co), 54mm Ø x 0.35mm. Purity 99.95%|
|Carbon fibre cord|
|300014||Carbon fibre cord on spool (holder), 1m|
|300015||Carbon fibre cord on spool (holder), 2m|
|Spare FTM quartz crystals|
|300016||Spare FTM piezoelectric quartz crystals, gold coated. Pack of 10|
Dimensions (unpacked): L 570 x W 360 x H 350mm. 25kg
Glass cylinder: Ø 120mm (DN 100 ISO-KF compatible)
Implosion guard: Plastic splinter shield around the glass cylinder
Targets: Ø 54mm and thickness up to 3mm
Coating time: 0.5 to 990s
Coating current 10-100mA
Pumping: Integrated, oil-free turbomolecular and membrane pumps
Ultimate vacuum: <2 x 10-6 mbar
Vacuum measurement: Pirani and cold cathode gauges
Display: 115 x 86mm, TFT graphical display
Specimen stage: Ø 80mm, height adjustment 0-50mm, tilt 0-45°
Film thickness measurement: Dual-position film thickness monitoring system. Piezoelectric crystal: frequency 6MHz, Ø 14mm, thickness 0.4mm.
Electrical: Plug C14, 90-260VAC, 47-63 Hz, 500W
Process gas connections: Process gas: Ø 6mm, venting gas: Ø 6mm, plasma gas: Ø 6mm
Electrical: Connector socket C13, secured with 10A therm. circuit breaker