Safematic CCU-010 LV standard vacuum sputter coater
The Safematic CCU-010 LV is a standard vacuum (rotary pumped) coater primarily designed for SEM sputtering and thin film applications using non-oxidising metals, such as gold and platinum. Note that for W-SEM and FE-SEM applications the high vacuum CCU-010 HV is recommend.
A unique feature is a compact, self-contained sputtering head module which ensure optimum ease of use and servicing. The CCU-010 LV comes as standard with a useful dual-position film thickness monitor (FTM) measurement.
The glass vacuum chamber is 120mm in diameter and includes a handy vertical graduated scale to help set the height of the specimen stage. An implosion guard with safety monitoring is also fitted. There are specimen stage options to suit most applications and and extensive range of other options - including sputtering targets and upgrades to high vacuum and to carbon evaporation.
CCU-010 LV sputter/carbon coater highlights
- Fully automatic sputter coating for SEM
- Plug-and-go, self-contained sputtering module - easy upgrade to carbon evaporation
- Routine, high quality sputtering of non-oxidising metals
- Dual location film thickness measurement as standard
- Intuitive, touch screen control - rapid data input, simple operation
Compact, plug-in sputter coating module
The SP-010 compact sputtering module conveniently includes all the features required for high quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The CCU-010 LV plus SP-010 sputtering module is designed for applications using non-oxidising metals (e.g. Au, Au/Pd, Pt etc.). For some thin film applications where extended sputtering times are required the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without the requirement of time consuming rest periods. There is also a high sputtering rate module (SP-011) available - useful for some non-EM applications. Note that for sputtering oxidising metals the CCU-010 HV high vacuum coater is required (see: CCU-010 HV).
Dual-position film thickness monitor as standard
A dual-position film thickness monitor (FTM) measurement system is fitted as standard on the CCU-010 LV specimen stage. Conveniently positioned in the same plane as the specimens this plug-in monitoring crystal can be moved between the centre of the stage and the outside, depending on specimen size.
Vacuum pumping requirements
The CCU-010 LV requires a "backing" rotary vacuum pump. With high performance, reliability and low noise characteristics, the Pfeiffer Pascal 2005 SD is ideally suited for this purpose. For further information see: Pfeiffer Pascal 2005 SD.
High vacuum upgrade - future proving your investment
If in the future you wish to upgrade the CCU-010 LV to high vacuum CCU-010 HV specification, then this is possible using one of two upgrade kits (see: Details below for ordering information).
The CCU-010 LV includes a static, but height and tilt angle adjustable, plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotary stage is recommended. For specimens with very irregular surfaces, particulates and spheres, the PS-010 rotary planetary stage is available.
ET-010 plasma cleaning accessory
The ET-010 plasma cleaning accessory is a fully integrated option for the Safematic CCU-010 sputter/carbon coater that is designed for the pre-treatment or post-treatment of specimens in combination with a coating process. SEM specimens can be pre-cleaned to remove light surface contamination prior to coating, without the need to breaking vacuum between cleaning and sputtering processes. Additionally,TEM carbon films can be converted from hydrophobic to hydrophilic using an air plasma.
Click here for detailed information: ET-010 plasma cleaning accessory
Coating LAB option
Offers easy access to coating and process data. The Windows software allows access to important data including pressure, current, voltage, coating rate, coating thickness and specimen temperature as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For further information see: Coating LAB.
HS-010 head module vacuum storage box
The HS-010 is a compact vacuum storage box which allows a second CCU-010 coating head for the CCU-010 module, additional planetary or rotary stage and the full range of sputtering targets and carbon thread clean and under vacuum when not in use.
For further information please see: HS-010 vacuum storage box.
Choosing a coater configuration and sputtering targets...
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide.
Learn more about the unique carbon sputtering and carbon modules...
Put us to the test
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CCU-010 base unit
CCU-010 sputtering module and etch options
CCU-010 specimen stages
CCU-010 Coating LAB and vacuum storage
The Edwards EMF10 filter captures oil mist from the outlet of pumps, which would otherwise be ejected into the atmosphere. The EMF10 mist filter is suitable for use with Edward RV3, RV5 and RV8 vacuum pumps. They are very efficient at 99.999% DOP test and are also azide proof. Supplied with a NW25 clamp, centering ring and ‘O’ ring, NW25 to 3/4 inch BSP adaptor.
Sputtering targets - please select your preferred metal/metals.
Note: oxidising metals can only be sputtered with a high vacuum coater, see: CCU-010 HV
Gold sputter targets
Gold palladium sputter targets
Platinum sputter targets
Other sputter targets
CCU-010 LV ordering information
|100001||CCU-010 LV. Compact coating system base unit. Low vacuum. External rotary pump (200002) or scroll pump required|
|Rotary vacuum pump|
|200002||Pfeiffer Pascal 2005 SD 5 m3/hr rotary pump with oil mist filter|
|TBA||Dry scroll pump 10 m3/hr (oil-free)|
|Options for coating and glow discharge|
|100002||SP-010. Sputtering head module|
|100012||SP-011. Sputtering head module for high sputtering rates|
|100003||CT-010. Carbon fibre cord evaporation head module, featuring a carbon spooling system for up to 50 depositions|
|100004||Glow discharge for hydrophobic/hydrophilic treatment of carbon films|
|Specimen stage options. The CCU-010 LV is fitted as standard with static specimen stage, with adjustment for height and tilt but no rotation|
|100005||RS-010 rotation stage (variable rotation speed)|
|100006||PS-010 rotary planetary stage (varible rotation speed)|
|400020||Additional 80mm Ø standard specimen platform|
|100008||Coating LAB software|
|200000||HV Upgrade Kit I. Includes Pfeiffer turbopump (Hi Pace 80), conversion kit and cable|
|200001||HV upgrade Kit II. Includes Pfeiffer turbopump (Hi Pace 80), Vacuubrand MD 1 VARIO-SP membrane pump, conversion kit and cable|
|300000||Sputter target gold (Au) 54 Ø x 1.0mm. Purity 99.99%|
|300017||Sputter target gold (Au) 54 Ø x 0.2mm. Purity 99.99%|
|300001||Sputter target gold/palladium (Au/Pd), 80/20, 54mm Ø x 1.0mm. Purity 99.99%|
|300002||Sputter target gold/palladium (Au/Pd), 70/30, 54mm Ø x 1.0mm. Purity 99.99%|
|300003||Sputter target gold/palladium (Au/Pd), 60/40, 54mm Ø x 1.0mm. Purity 99.99%|
|300004||Sputter target platinum (Pt), 54mm Ø x 0.2mm. Purity 99.95%|
|300005||Sputter target silver (Ag), 54mm Ø x 1.0mm. Purity 99.99%|
|300007||Sputter target nickel (Ni), 54mm Ø x 3.5mm. Purity 99.99%|
|300011||Sputter target iron (Fe), 54mm Ø x 3.5mm. Purity 99.99%|
|300013||Sputter target copper (Cu), 54mm Ø x 1.0mm. Purity 99.99%|
|300019||Sputter target platinum/Iridium (Pt/Ir), 54mm Ø x 1.0. Purity 99.95%|
|300020||Sputter target iridium (Ir), 54mm Ø x 1.0mm. Purity 99.95%|
|300021||Sputter target platinum/palladium (Pt/Pd), 54mm Ø x 0.5mm. Purity 99.99%|
|Carbon fibre cord|
|300014||Carbon fibre cord on spool (holder), 1m|
|300015||Carbon fibre cord on spool (holder), 2m|
|Spare FTM quartz crystals|
|300016||Spare FTM piezoelectric quartz crystals, gold coated. Pack of 10|
Dimensions (unpacked): L 570 x W 360 x H 350mm. 25kg
Glass cylinder: Ø 120mm (DN 100 ISO-KF compatible)
Implosion guard: Plastic splinter shield around the glass cylinder
Targets: Ø 54mm and thickness up to 3mm
Coating time: 0.5 to 990s
Coating current 10-100mA
Pumping: External rotary vacuum pump (option)
Ultimate vacuum: < 5 x 10-3 mbar (with Pfeiffer Pascal 2005 SD rotary vacuum pump)
Vacuum measurement: Pirani measuring gauge (measuring range up to 1e-3 mbar) Pirani and cold cathode measuring system
Display: 115 x 86mm, TFT graphical display
Specimen stage: Ø 80mm, height adjustment 0-50mm, tilt 0-45°
Film thickness measurement: Dual-position film thickness monitoring system. Piezoelectric crystal: frequency 6MHz, Ø 14mm, thickness 0.4mm.
Electrical: Plug C14, 90-260VAC, 47-63 Hz, 500W
Process gas connections: Process gas: Ø 6mm, venting gas: Ø 6mm, plasma gas: Ø 6mm
Rotary pump connections: Flange connection DN 25 ISO-KF
Electrical: Connector socket C13, secured with 10A therm. circuit breaker