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The Safematic CCU-010 LV standard vacuum coater is suitable for SEM sputter coating with non-oxidising (noble) metals and carbon coating applications. Requires coating module/modules and rotary pump.
Safematic CCU-010 LV standard vacuum sputter coater
Introduction
The Safematic CCU-010 LV is a standard vacuum (rotary pumped) coater primarily designed for SEM sputtering and thin film applications using non-oxidising metals, such as gold and platinum. Note that for W-SEM and FE-SEM applications the high vacuum CCU-010 HV is recommend.
A unique feature is a compact, self-contained sputtering head module which ensure optimum ease of use and servicing. The CCU-010 LV comes as standard with a useful dual-position film thickness monitor (FTM) measurement.
The glass vacuum chamber is 120mm in diameter and includes a handy vertical graduated scale to help set the height of the specimen stage. An implosion guard with safety monitoring is also fitted. There are specimen stage options to suit most applications and and extensive range of other options - including sputtering targets and upgrades to high vacuum and to carbon evaporation.
CCU-010 LV sputter/carbon coater highlights
- Fully automatic sputter coating for SEM
- Plug-and-go, self-contained sputtering module - easy upgrade to carbon evaporation
- Routine, high quality sputtering of non-oxidising metals
- Dual location film thickness measurement as standard
- Intuitive, touch screen control - rapid data input, simple operation
Compact, plug-in sputter coating module
The SP-010 compact sputtering module conveniently includes all the features required for high quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The CCU-010 LV plus SP-010 sputtering module is designed for applications using non-oxidising metals (e.g. Au, Au/Pd, Pt etc.). For some thin film applications where extended sputtering times are required the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without the requirement of time consuming rest periods. There is also a high sputtering rate module (SP-011) available - useful for some non-EM applications. Note that for sputtering oxidising metals the CCU-010 HV high vacuum coater is required (see: CCU-010 HV).
Dual-position film thickness monitor as standard
A dual-position film thickness monitor (FTM) measurement system is fitted as standard on the CCU-010 LV specimen stage. Conveniently positioned in the same plane as the specimens this plug-in monitoring crystal can be moved between the centre of the stage and the outside, depending on specimen size.
Vacuum pumping requirements
The CCU-010 LV requires a "backing" rotary vacuum pump. With high performance, reliability and low noise characteristics, the Pfeiffer Pascal 2005 SD is ideally suited for this purpose. For further information see: Pfeiffer Pascal 2005 SD.
High vacuum upgrade - future proving your investment
If in the future you wish to upgrade the CCU-010 LV to high vacuum CCU-010 HV specification, then this is possible using one of two upgrade kits (see: Details below for ordering information).
Specimen stages
The CCU-010 LV includes a static, but height and tilt angle adjustable, plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotary stage is recommended. For specimens with very irregular surfaces, particulates and spheres, the PS-010 rotary planetary stage is available.
ET-010 etching accessory
The ET-010 etching accessory is a fully integrated option for the Safematic CCU-010 sputter/carbon coater that is designed for the pre-treatment or post-treatment of specimens in combination with a coating process. SEM specimens can be pre-cleaned to remove light surface contamination prior to coating, without the need to breaking vacuum between etching and sputtering processes. Additionally,TEM carbon films can be converted from hydrophobic to hydrophilic using an air plasma.
Click here for detailed information: ET-010 etching accessory
Coating LAB option
Offers easy access to coating and process data. The Windows software allows access to important data including pressure, current, voltage, coating rate, coating thickness and specimen temperature as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For further information see: Coating LAB.
HS-010 head module vacuum storage box
The HS-010 is a compact vacuum storage box which allows a second CCU-010 coating head for the CCU-010 module, additional planetary or rotary stage and the full range of sputtering targets and carbon thread clean and under vacuum when not in use.
For further information please see: HS-010 vacuum storage box.
Choosing a coater configuration and sputtering targets...
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide.
Learn more about the unique carbon sputtering and carbon modules...
CT-010 carbon evaporation module
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Ordering information
CCU-010 base unit
CCU-010 sputtering module and etch options
Advanced, plug-in sputtering head module with built-in cooling for optimum performance (for very fast sputtering rates see: 100012)
For applications requiring very fast sputtering rates
Etching accessory for the Safematic CCU-010 sputter/carbon coater for the pre-treatment or after-treatment of specimens in combination with a coating process
CCU-010 specimen stages
Height and angle adjustable 80mm diameter specimen stage with variable rotation.
Rotary planetary motion with variable speed and an 80mm diameter specimen platform. Plug-in style.
CCU-010 Coating LAB and vacuum storage
Window-based software offering easy access to coating and process data: pressure, current, voltage, coating rate, coating thickness and specimen temperature
A compact vacuum storage system for CCU-010 head modules and other accessories. Can be pumped by the coater or separate rotary pump (not supplied)
Pumping options
Edwards nXDS6i dry scroll vacuum pump. Peak pumping speed: 6.2 m3h-1 . Suitable for applications where oil-based rotary pumps need to be avoided.
Pumping speed: 3.3 m3h-1 (50hz). The RV3 oil-sealed rotary vane pumps delivers excellent ultimate vacuum pressure, high pumping speeds and superior vapour handling capabilities with quiet operation. Requires an EMF10 mist filter (A4622600)
The Edwards EMF10 filter captures oil mist from the outlet of pumps, which would otherwise be ejected into the atmosphere. The EMF10 mist filter is suitable for use with Edward RV3, RV5 and RV8 vacuum pumps. They are very efficient at 99.999% DOP test and are also azide proof. Supplied with a NW25 clamp, centering ring and ‘O’ ring, NW25 to 3/4 inch BSP adaptor.
Sputtering targets - please select your preferred metal/metals.
Note: oxidising metals can only be sputtered with a high vacuum coater, see: CCU-010 HV
Gold sputter targets
Sputtering target, gold (Au) Ø 54 x 1.0mm in diameter, purity 99.99% (each)
Sputtering target, gold (Au) Ø 54 x 0.2mm purity 99.99% (each)
Gold sputtering target, Ø54 x 0.1mm disc, 99.99% Au (each)
Gold palladium sputter targets
Sputtering target, gold/palladium 80/20 (Au/Pd) Ø 54 x 1.0mm purity 99.99% (each)
Sputter target gold palladium 70/30 (Au/Pd) Ø 54 x 1 mm purity 99.99% (each)
Sputter target gold palladium 60/40 (Au/Pd) Ø 54 x 1.0 mm purity 99.99% (each)
Gold/Palladium sputtering target, Ø54 x 0.1mm disc, 60/40 Au/Pd, 99.99% Au/Pd (each)
Gold/Palladium sputtering target, Ø54 x 0.1mm disc, 80/20 Au/Pd, 99.99% Au/Pd (each)
Gold/Palladium sputtering target, Ø54 x 0.2mm disc, 60/40 Au/Pd, 99.99% Au/Pd (each)
Gold/Palladium sputtering target, Ø54 x 0.2mm disc, 80/20 Au/Pd, 99.99% Au/Pd (each)
Platinum sputter targets
Sputtering target, platinum (Pt) Ø 54 x 0.2mm purity 99.95% (each)
Platinum target, Ø54 x 0.1mm disc, 99.99% Pt
Other sputter targets
Sputtering target, silver (Ag) Ø 54 x 1 mm purity 99.99% (each)
Sputtering target, Iron (Fe) Ø 54 x 0.35mm purity 99.9% (each)
Sputter target, copper (Cu) Ø 54 x 1.0mm purity 99.99% (each)
Sputtering target, platinum/iridium (Pt/Ir) Ø 54 x 1.0mm purity 99.95% (each)
Sputtering target platinum/palladium (Pt/Pd) Ø 54 x 0.5mm purity 99.95% (each)
Palladium sputtering target, Ø54 x 0.1mm disc, 99.99% Pd (each)
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