Safematic CCU-010 LV standard vacuum sputter/carbon coater
Sputter coating, carbon evaporation and film thickness measurement
The Safematic CCU-010 LV is a low vacuum coater designed for SEM sputtering and thin film applications using non-oxidising metals, such as gold and platinum, and for carbon coating of SEM specimens for EDS and WDS.
A unique feature are compact, self-contained sputtering and carbon evaporation head modules which ensure optimum ease of use and servicing. Modules are plug-in style and can be exchanged in seconds.
A stand-out highlight of the carbon evaporation head is a unique (patented) carbon fibre spooling system. This allows up to 50 carbon coatings to be carried out without the need to change the carbon source - a huge advantage over other labour intensive “single shot” carbon coating systems.
The glass vacuum chamber is 120mm in diameter and has a handy vertical graduated scale to help set the height of the specimen stage. With safety in mind the implosion guard has automatic monitoring so the system cannot be operated unless the guard is in place. The CCU-010 LV requires a rotary vacuum pump (see below) which connects directly into the back of the coater with a vacuum hose.
Looking for high vacuum (turbo pumped) sputtering and carbon coating? Please see the Safematic CCU-010 HV.
CCU-010 LV sputter/carbon coater highlights
- Fully automatic sputtering and carbon coating for SEM
- Plug-and-go, self-contained sputter/carbon coating modules
- Routine, high quality sputtering of non-oxidising metals
- Quartz film thickness measurement as standard
- Intuitive, touch screen control - rapid data input, simple operation
- Up to 50 carbon evaporation runs before source change
- Sputtering head cooling and monitoring - helps ensure optimum coating conditions
Compact, plug-in sputter coating module
The SP-010 compact sputtering module conveniently includes all the features required for high quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The CCU-010 LV plus SP-010 sputtering module is designed for applications using non-oxidising metals (e.g. Au, Au/Pd, Pt etc.). For some thin film applications where extended sputtering times are required the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without the requirement of time consuming rest periods. There is also a high sputtering rate module (SP-011) available - useful for some non-EM applications. For sputtering oxidising metals the CCU-010 HV high vacuum coater is required (see: CCU-010 HV).
Click here for detailed information: SP-010 sputter coating modules
Carbon coating module - sequential carbon evaporation and glow discharge
A highlight of the carbon coating module (CT-010) is the novel carbon fibre evaporation system - featuring a proprietary (patent pending) automatic carbon fibre spooling system. This allows up to 50 coating runs without the need to change the carbon source – a huge advantage over labour intensive “single shot” carbon coating systems.
The primary application of the glow discharge option (100004) is for the post-treatment of carbon films. Conveniently the glow discharge attachment clips directly onto the carbon evaporation module. This allows sequential carbon coating and glow discharge treatment without the inconvenience and time delay of having to “break” vacuum and exchange process heads.
Click here for detailed information: CT-010 carbon coating module
Dual-position film thickness monitor - fitted as standard
Included as standard is a dual-position film thickness monitor (FTM) measurement system, which monitors and terminates the sputter coating and carbon coating processes at a user-defined thicknesses. To accommodate different specimen sizes the plug-in monitoring quartz crystal and holder can be moved between the centre of the coater specimen stage and the outside.
Vacuum pumping requirements
The CCU-010 LV requires a "backing" rotary vacuum pump. With high performance, reliability and low noise characteristics, the Pfeiffer Pascal 2005 SD is ideally suited for this purpose. For further information see: Pfeiffer Pascal 2005 SD.
High vacuum upgrade - future proving your investment
If in the future you wish to upgrade the CCU-010 LV to high vacuum CCU-010 HV specification, then this is possible using one of two upgrade kits (see: Details below for ordering information).
The CCU-010 LV includes a static, but height and tilt angle adjustable, plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotary stage is recommended. For specimens with very irregular surfaces, particulates and spheres, the PS-010 rotary planetary stage is available.
Coating LAB option
Offers easy access to coating and process data. The Windows software allows access to important data including pressure, current, voltage, coating rate, coating thickness and specimen temperature as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For further information see: Coating LAB.
Selecting a coater
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide.
CCU-010 base unit
CCU-010 coating modules and glow discharge options
CCU-010 specimen stages and Coating LAB
The Edwards EMF10 filter captures oil mist from the outlet of pumps, which would otherwise be ejected into the atmosphere. The EMF10 mist filter is suitable for use with Edward RV3, RV5 and RV8 vacuum pumps. They are very efficient at 99.999% DOP test and are also azide proof. Supplied with a NW25 clamp, centering ring and ‘O’ ring, NW25 to 3/4 inch BSP adaptor.
Sputtering targets - please select your preferred metal/metals.
Note: oxidising metals can only be sputtered with a high vauum coater, see: CCU-010 HV
Gold sputter targets
Gold/palladium sputter targets
Platinum sputter targets
Other sputter targets
CCU-010 LV ordering information
|100000||CCU-010 LV. Compact coating system base unit. Low vacuum. External rotary pump (200002) or scroll pump required|
|Rotary vacuum pump|
|200002||Pfeiffer Pascal 2005 SD 5 m3/hr rotary pump with oil mist filter|
|TBA||Dry scroll pump 10 m3/hr (oil-free)|
|Options for coating and glow discharge|
|100002||SP-010. Sputtering head module|
|100012||SP-011. Sputtering head module for high sputtering rates|
|100003||CT-010. Carbon fibre cord evaporation head module, featuring a carbon spooling system for up to 50 depositions|
|100004||Glow discharge for hydrophobic/hydrophilic treatment of carbon films|
|Specimen stage options. The CCU-010 LV is fitted as standard with static specimen stage, with adjustment for height and tilt but no rotation|
|100005||RS-010 rotation stage (variable rotation speed)|
|100006||PS-010 rotary planetary stage (varible rotation speed)|
|400020||Additional 80mm Ø standard specimen platform|
|100008||Coating LAB software|
|200000||HV Upgrade Kit I. Includes Pfeiffer turbopump (Hi Pace 80), conversion kit and cable|
|200001||HV upgrade Kit II. Includes Pfeiffer turbopump (Hi Pace 80), Vacuubrand MD 1 VARIO-SP membrane pump, conversion kit and cable|
|300000||Sputter target gold (Au) 54 Ø x 1.0mm. Purity 99.99%|
|300017||Sputter target gold (Au) 54 Ø x 0.2mm. Purity 99.99%|
|300001||Sputter target gold/palladium (Au/Pd), 80/20, 54mm Ø x 1.0mm. Purity 99.99%|
|300002||Sputter target gold/palladium (Au/Pd), 70/30, 54mm Ø x 1.0mm. Purity 99.99%|
|300003||Sputter target gold/palladium (Au/Pd), 60/40, 54mm Ø x 1.0mm. Purity 99.99%|
|300004||Sputter target platinum (Pt), 54mm Ø x 0.2mm. Purity 99.95%|
|300005||Sputter target silver (Ag), 54mm Ø x 1.0mm. Purity 99.99%|
|300007||Sputter target nickel (Ni), 54mm Ø x 3.5mm. Purity 99.99%|
|300011||Sputter target iron (Fe), 54mm Ø x 3.5mm. Purity 99.99%|
|300013||Sputter target copper (Cu), 54mm Ø x 1.0mm. Purity 99.99%|
|300019||Sputter target platinum/Iridium (Pt/Ir), 54mm Ø x 1.0. Purity 99.95%|
|300020||Sputter target iridium (Ir), 54mm Ø x 1.0mm. Purity 99.95%|
|300021||Sputter target platinum/palladium (Pt/Pd), 54mm Ø x 0.5mm. Purity 99.99%|
|Carbon fibre cord|
|300014||Carbon fibre cord on spool (holder), 1m|
|300015||Carbon fibre cord on spool (holder), 2m|
|Spare FTM quartz crystals|
|300016||Spare FTM piezoelectric quartz crystals, gold coated. Pack of 10|
Dimensions (unpacked): L 570 x W 360 x H 350mm. 25kg
Glass cylinder: Ø 120mm (DN 100 ISO-KF compatible)
Implosion guard: Plastic splinter shield around the glass cylinder
Targets: Ø 54mm and thickness up to 3mm
Coating time: 0.5 to 990s
Coating current 10-100mA
Pumping: External rotary vacuum pump (option)
Ultimate vacuum: < 5 x 10-3 mbar (with Pfeiffer Pascal 2005 SD rotary vacuum pump)
Vacuum measurement: Pirani measuring gauge (measuring range up to 1e-3 mbar) Pirani and cold cathode measuring system
Display: 115 x 86mm, TFT graphical display
Specimen stage: Ø 80mm, height adjustment 0-50mm, tilt 0-45°
Film thickness measurement: Dual-position film thickness monitoring system. Piezoelectric crystal: frequency 6MHz, Ø 14mm, thickness 0.4mm.
Electrical: Plug C14, 90-260VAC, 47-63 Hz, 500W
Process gas connections: Process gas: Ø 6mm, venting gas: Ø 6mm, plasma gas: Ø 6mm
Rotary pump connections: Flange connection DN 25 ISO-KF
Electrical: Connector socket C13, secured with 10A therm. circuit breaker